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Two artists chosen for AVA residency

Melanie Steffl to focus on digitalization of imagery, Lucca Dust on mask-making

Published on September 5, 2018 12:03PM

A shaman mask by Lucca Dust.

Courtesy Astoria Visual Arts

A shaman mask by Lucca Dust.

Lucca Dust.

Courtesy Lucca Dust

Lucca Dust.

Melanie Steffl.

Courtesy Astoria Visual Arts

Melanie Steffl.


ASTORIA — Astoria Visual Arts welcomes artists Melanie Steffl and Lucca Dust to work in its studios at 80 11th St. in Astoria, rent-free, as part of the AVA artist-in-residence (“AVA a-i-r”) program. The residency runs through Dec. 31.

“Melanie and Lucca were selected from a competitive field of terrific applicants,” AVA Board President Lisa Smith said. “It was a difficult choice, but they were the two standouts. Their respective work is highly original and of a very special nature — albeit quite different. Melanie’s practice is focused on the digitalization of imagery, whereas Lucca’s current interest lies in three-dimensional mask-making.”

Steffl received her MFA in contemporary art practice from the University of Edinburgh in Scotland and her BFA in studio drawing from Bowling Green State University in Ohio.

“My goals for this residency include taking my art practice another step towards combining traditional image-making with contemporary ideology,” Steffl wrote in her AVA residency application. “This would culminate in an installation at the end of the residency based on the un/recognizable climate change at the mouth of the Columbia River.”

Dust has studied on a fellowship in Japan and traveled in Mexico, as well as the UK and Italy, as an aspirant in Mother Teresa’s order. She earned a teaching degree from the University of Portland and taught at schools in Oregon and Colorado and on the Navajo Reservation.

Dust says she will use the residency to “have enough room to create hide, clay, felt and papier-mâché mask forms,” and to develop a body of work worthy of an exhibition.





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